TUPHO, for large-scale production of integrated photonic circuits

Although PICs have the potential to revolutionize fields such as sensing, quantum technologies, computing, and telecommunications—by offering increased performance, reduced energy consumption, and lower costs—their industrialization remains limited due to very low production yields caused by manufacturing imperfections. Even though manufacturing dimensional errors are now only a few nanometers, they still need to be minimized to the picometer scale to achieve a functional device yield of over 90%. The TUPHO project addresses this critical bottleneck with a patented post-fabrication technique that permanently corrects manufacturing errors at the wafer scale. This method allows photonic devices to be adjusted with unparalleled precision—at the picometer scale and below—paving the way for high-yield, large-scale production for the PIC industry.

Open to all start-up projects involving the CNRS, the RISE program allows project leaders to benefit from the expertise and network of CNRS Innovation, and to successfully complete their project thanks to a year of support at each stage of development, provided by a team of dedicated experts and mentors.

Contacts: Hamidreza Neshasteh, Ivan Favero